TY - GEN
T1 - Peeling prevention by SiO layer for far-infrared filter consisting of Ge/Na3AlF6
AU - Muro, Koichi
N1 - Publisher Copyright:
© OSA 2019 © 2019 The Author(s)
PY - 2019
Y1 - 2019
N2 - We found the effect of peeling prevention by SiO layer on the Na3AlF6 ultra-thick film constituting the far-infrared filter (Ge/Na3AlF6). Using this filter, the HFC gas imaging was performed with a thermal camera.
AB - We found the effect of peeling prevention by SiO layer on the Na3AlF6 ultra-thick film constituting the far-infrared filter (Ge/Na3AlF6). Using this filter, the HFC gas imaging was performed with a thermal camera.
UR - http://www.scopus.com/inward/record.url?scp=85085640011&partnerID=8YFLogxK
U2 - 10.1364/OIC.2019.MC.12
DO - 10.1364/OIC.2019.MC.12
M3 - 会議への寄与
AN - SCOPUS:85085640011
SN - 9781943580583
T3 - Optics InfoBase Conference Papers
BT - Optical Interference Coatings, OIC 2019
PB - Optica Publishing Group (formerly OSA)
T2 - Optical Interference Coatings, OIC 2019
Y2 - 2 June 2019 through 7 June 2019
ER -